UniMAP Full Automatic Reflectivity Mapping System

Measure Time (Wafer / Cassette)

  • 31sec / 20.5min

Throughput (Monthly)

  • 52,000

Measure Time (Wafer / Cassette)

  • 150sec / 70.1min

Throughput (Monthly)

  • 15,400

Measure Time (Wafer / Cassette)

  • 76sec / 39.3min

Throughput (Monthly)

  • 27,400

Measure Time (Wafer / Cassette)

  • 270sec / 120.1min

Throughput (Monthly)

  • 8,990
  • Critical control of PSS process (Inner Wafer, Wafer/Wafer, Run/Run, Machine/Machine)
  • Real time monitoring optical power for Light source and Reflectivity of standard samples.
  • User Friendly Viewer / Wafer Carrier Viewer
  • Optional Bowing Mapping / Laser Marking
  • GEM/SECS Compatible

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