UniMAP

Full automatic PL Mapping System

PLATO is a full automatic PL Mapping System used to generate maps of several parameters over full wafers by measuring optical luminescence emission from materials excited with energy above their bandgap. EtaMax mapping systems are used in production environment to provide key information on epitaxy layer crystal quality, composition and homogeneity.

Features

Features
Critical control of PSS process (Inner Wafer, Wafer/Wafer, Run/Run, Machine/Machine)
Real time monitoring optical power for Light source and Reflectivity of standard samples.
User Friendly Viewer / Wafer Carrier Viewer
Optional Bowing Mapping / Laser Marking
GEM/SECS Compatible

Optical configuration

Measurement principle - Sapphire

Measurement principle - PPS

Examples/ PSS Testing

ICP maker 1ICP maker 1

Measurement principle - PPS

ICP Maker B : Cross line from He gas path

Reclaimed PSS maker

Benefits

Benefits
Wafer options for 2" to 6"
Wafer sorting function
Low maintenance, easy to use
Full automatic loading

Specifications

Dimensions

  • 1526 x 926 x 1412 mm

Weight

  • 480kg (Automatic)

Input Voltage

  • 220V / 30A

Vacuum/CDA

  • -80 KPa / 0.2 – 0.4 MPa

Specifications

  • XY&Z Stage
  • Cassette Loading
  • Flat Zone Finder
  • 6 cassette load ports for 2-6 inch wafers

Standard

  • 2 Inch
  • 4 Inch
  • 6 Inch

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Thickness

  • Measurement Method: Optical Interference by Reflection
  • Accuracy: 3% for GaN Film

Spectrometer

  • Wavelength Range: 420nm
  • Hardware Pixel Resolution: 0.13nm/pixel

Optical Resolution

  • 0.1mm for 2″
  • 0.3mm for 4″
  • 0.5mm for 8″

Measurement Items

  • Wp (peak), Wd (dominant), Integrated and Peak Intensity, FWHM

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Thickness / PL

  • PL & Thickness Measurement at the same time

Viewer Software

  • Line Profile, Suspector Viewer, etc.

Pumping Laser

  • Up to 3 Kinds of Lasers (255, 405, 532, etc.)
  • Can be Installed

Reproducibility

  • ±3% (or ±3 ㎛ for under 100 ㎛ bowing)

Measuring Range

  • 20-1000 ㎛

Tact Time

  • < 10 Sec

Bowing Mapping

  • Possible

Application

  • Clean room(Class -10,000)

Temperature

  • 15-35℃

Humidity

  • <85%RH with no condensation

Capacity

Model: UniMAP

WPH: Wafers per Hour
WPM: Wafers / Month

1mm Step

4″ Wafer = 34 WPH

6″ Wafer = 18 WPH


2mm Step

4″ Wafer = 56 WPH

6″ Wafer = 33 WPH

1mm Step

4″ Wafer = 20,500 WPM

6″ Wafer = 10,800 WPM


2mm Step

4″ Wafer = 34,000 WPM

6″ Wafer = 19,800 WPM

 

Information