PLATO Full Automatic PL Mapping System
Dimensions (W x D x H)
- 1490 x 930 x 1410 mm
- 480kg (Automatic)
- 220V / 30A
- 0.2 – 0.4MPa
- X-Y Stage
- Cassette Loading
- Flat Zone Finder
- Two Cassette for 2,4,6,8 Inch Wafer
- 2 Inch
- 4 Inch
- 6 Inch
- 8 Inch
- Measurement Method: Optical Interference by Reflection
- Accuracy: 3% for GaN Film
- Wavelength Range: 420nm
- Hardware Pixel Resolution: 0.13nm/pixel
- 0.5mm for 2″
- 1mm for 4″
- 2mm for 8″
- Wp (peak), Wd (dominant), Integrated and Peak Intensity, FWHM
Thickness / PL
- PL & Thickness Measurement at the same time
- Line Profile, Suspector Viewer, etc.
- Up to 3 Kinds of Lasers (255, 405, 532, etc.)
- Can be Installed
- + 5μm
- 20 – 40μm
Cap (2inch Profile)
- < 10 Sec
- High sensitive Photodetector is used in PL intensity measurement to improve Repeatability for time-to-time and machine-to-machine.
- Save time with same-time measurement of PL and thickeness.
- 2inch – 8inch, up to 0.5mm step (height variation for different thickness wafer with adoption of z-stage)
- Optional Bowing Mapping / Laser Marking.
- Capacity: 60,000pcs (2″ with 2mm step)
- Powerful Suspector Solution
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