PLATO Full Automatic PL Mapping System

Dimensions (W x D x H)

  • 1490 x 930 x 1410 mm

Weight

  • 480kg (Automatic)

Input Voltage

  • 220V / 30A

Compressed Air

  • 0.2 – 0.4MPa
  • X-Y Stage
  • Cassette Loading
  • Flat Zone Finder
  • Two Cassette for 2,4,6,8 Inch Wafer

Standard

  • 2 Inch
  • 4 Inch
  • 6 Inch
  • 8 Inch

Thickness

  • Measurement Method: Optical Interference by Reflection
  • Accuracy: 3% for GaN Film

Spectrometer

  • Wavelength Range: 420nm
  • Hardware Pixel Resolution: 0.13nm/pixel

Resolution

  • 0.5mm for 2″
  • 1mm for 4″
  • 2mm for 8″

Measurement Items

  • Wp (peak), Wd (dominant), Integrated and Peak Intensity, FWHM

Thickness / PL

  • PL & Thickness Measurement at the same time

Viewer Software

  • Line Profile, Suspector Viewer, etc.

Pumping Laser

  • Up to 3 Kinds of Lasers (255, 405, 532, etc.)
  • Can be Installed

Reproducibility

  • + 5μm

Measuring Range

  • 20 – 40μm

Cap (2inch Profile)

  • < 10 Sec

Bowing Mapping

  • Possible
  • High sensitive Photodetector is used in PL intensity measurement to improve Repeatability for time-to-time and machine-to-machine.
  • Save time with same-time measurement of PL and thickeness.
  • 2inch – 8inch, up to 0.5mm step (height variation for different thickness wafer with adoption of z-stage)
  • Optional Bowing Mapping / Laser Marking.
  • Capacity: 60,000pcs (2″ with 2mm step)
  • Powerful Suspector Solution

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