UniMAP

Full automatic PL Mapping System

PLATO is a full automatic PL Mapping System used to generate maps of several parameters over full wafers by measuring optical luminescence emission from materials excited with energy above their bandgap. EtaMax mapping systems are used in production environment to provide key information on epitaxy layer crystal quality, composition and homogeneity.

Features

Features
Critical control of PSS process (Inner Wafer, Wafer/Wafer, Run/Run, Machine/Machine)
Real time monitoring optical power for Light source and Reflectivity of standard samples.
User Friendly Viewer / Wafer Carrier Viewer
Optional Bowing Mapping / Laser Marking
GEM/SECS Compatible

Optical configuration

Measurement principle - Sapphire

Measurement principle - PPS

Examples/ PSS Testing

ICP maker 1ICP maker 1

Measurement principle - PPS

ICP Maker B : Cross line from He gas path

Reclaimed PSS maker

Benefits

Benefits
Wafer options for 2" to 6"
Wafer sorting function
Low maintenance, easy to use
Full automatic loading

Specifications

Capacity

Information